4.6 Article Proceedings Paper

Amorphous carbon nitride deposition by nitrogen radical sputtering C+N+O+H

Journal

DIAMOND AND RELATED MATERIALS
Volume 12, Issue 2, Pages 219-226

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/S0925-9635(03)00073-6

Keywords

carbon nitride; oxide; photoconductors; low dielectric constant; heavy particle detector

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Amorphous carbon nitride films a-CNx were prepared by a nitrogen radical sputtering of a carbon target. A-CNx films were treated by atomic hydrogen or by an oxygen plasma, using a layer-by-layer method, forming LLa-CNx or LLa-CNxOy. These a-CNx films show large photosensitivity, high resistivity and low dielectric constants. Possible applications are also discus sed briefly. (C) 2003 Elsevier Science B.V. All rights reserved.

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