Journal
JOURNAL DE PHYSIQUE IV
Volume 104, Issue -, Pages 99-102Publisher
E D P SCIENCES
DOI: 10.1051/jp4:200300038
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High lateral resolution direct imaging of surfaces with chemical sensitivity is of increasing importance for basic and applied research in the field of surface and materials science. A novel and versatile beamline, to be employed for the spectromicroscopic study of surfaces in the submicron range, is now available at Elettra. The beamline, named Nanospectroscopy, serves an end-station equipped with a Spectroscopic Photo-Emission and Low Energy Electron Microscope (SPELEEM). This microscope combines the ability to perform XPEEM (X-ray Photo-Emission Electron Microscopy), small spot XPS (X-ray Photoelectron Spectroscopy), XPD (X-ray Photoelectron Diffraction), LEEM and LEED (Low Energy Electron Microscopy and Diffraction, respectively).
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