Journal
MICROELECTRONIC ENGINEERING
Volume 66, Issue 1-4, Pages 65-69Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/S0167-9317(03)00026-1
Keywords
crystallization; stacking faults; SiNWs; annealing
Ask authors/readers for more resources
The crystallization and the disappearance of the defects and impurity stress of silicon nanowires (SiNWs) after annealing at high temperature (900 degreesC) have been investigated. The chemical-vapor-deposition (CVD) and alumina template technology were used for the synthesis of the SiNWs. Then transmission electron microscopy (TEM), selected-area electron diffraction (SAED) and photoluminescence (PL) spectra were used to study the crystallization procedure and the disappearance of defects of the SiNWs. (C) 2003 Elsevier Science B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available