4.7 Article

All ITO-based transparent resistive switching random access memory using oxygen doping method

Journal

JOURNAL OF ALLOYS AND COMPOUNDS
Volume 653, Issue -, Pages 534-538

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2015.09.076

Keywords

Transparent memory; Oxygen-doped indium thin oxide; Unipolar switching

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Recently, transparent memory would be useful in invisible electronics. In this work, for the first time we present a feasibility of stable unipolar resistive switching (RS) characteristics with reset current of submicron ampere for the fully transparent ITO/oxygen-doped ITO/ITO memory capacitors, i.e., all ITO structures, produced by sputtering method, which shows a high optical transmittance of approximately 80% in the visible region as well as near ultra-violet region. In addition, in a RS test to evaluate a reliability for the proposed memory devices, we observed a stable endurance of > 100 cycles and a retention time of > 10(4) s at 85 degrees C, with a current ratio of similar to 10(2) to similar to 10(3). This result indicates that this transparent memory by engineering the amount of oxygen ions within the ITO films could be a milestone for future see-through electronic devices. (C) 2015 Elsevier B.V. All rights reserved.

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