Journal
REVIEW OF SCIENTIFIC INSTRUMENTS
Volume 74, Issue 5, Pages 2894-2898Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1569405
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A new stitching interferometry based on a microscopic interferometer having peak-to-valley height accuracy of subnanometer order and lateral resolution higher than 20 mum was developed to measure surface figures of large-size x-ray mirror optics. Cumulative errors of the stitching angle in a long spatial wavelength range were effectively reduced to be 1x10(-7) rad levels using another interferometer having a large cross section in the optical cavity. Some optical performances of ultraprecise x-ray mirrors, such as submicrofocused beam profile, were wave optically calculated from the measured surface figure profiles and observed at the 1 km long beamline (BL29XUL) of SPring-8. Observed and wave optically calculated results were in good agreement with a high degree of accuracy. (C) 2003 American Institute of Physics.
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