Journal
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY
Volume 41, Issue 10, Pages 1486-1496Publisher
JOHN WILEY & SONS INC
DOI: 10.1002/pola.10681
Keywords
parylene; photochemistry; functionalization of polymers; barrier
Categories
Ask authors/readers for more resources
Parylene-N and parylene-C are polymers of interest for microelectronic and medical coating applications. Modifications for improved surface properties could make them even more useful in such applications. Parylene-N and parylene-C films were exposed to ultraviolet light in the presence of oxygen and analyzed with Rutherford backscattering spectrometry, secondary-ion mass spectroscopy, X-ray photoelectron spectroscopy, and infrared spectroscopy. This study shows that such exposure results in the formation of aldehyde and carboxylic acid groups near the surface of the films. At the maximum exposure dose, the concentration of oxygen in both parylene-N and parylene-C is about 13% at the film surface, and it decreases exponentially with increasing depth. Further modeling and optimization of this process would allow it to be used to tailor the surface concentration of oxygenated species in parylene for the optimization of adhesion and wettability or for the chemical binding of other moieties. (C) 2003 Wiley Periodicals,
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available