Journal
MACROMOLECULAR SYMPOSIA
Volume 196, Issue -, Pages 45-56Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/masy.200390175
Keywords
block copolymers; nanolithography; organometallic polymers; polyelectrolytes; reactive ion etching
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Thin films of organic-organometallic block copolymers are shown to be efficient self-assembled templates for nanolithography. Block copolymers composed of organic blocks such as polyisoprene or polystyrene and a poly(ferrocenylsilane) block microphase separate to form a monolayer of densely packed organometallic spheres in an organic matrix. The high resistance of the organometallic phase to reactive ion etching enables the nanoscale patterns to be transferred into silicon substrates, forming nanostructured surfaces. Electrostatic self-assembly of poly(ferrocenylsilane) polyanions and polycations is discussed as a means to form laterally structured organometallic multilayer thin films by area-selective adsorption onto chemically patterned substrates.
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