Journal
IEEE SENSORS JOURNAL
Volume 3, Issue 3, Pages 267-273Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JSEN.2003.814649
Keywords
mass production; micromachined glucose sensor; monolithic integration; plasma-treated Ag/AgCl reference electrode; potential drift
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Micromachined glucose sensors were fabricated and integrated with the plasma-treated Ag/AgCl reference electrodes for the first time. The surface of the Cl-plasma exposed AgCl layers was of granule-shaped morphology and showed the favorable long-term stability with a 13-mV potential drift after 5 h over a commercial liquid-junction Ag/AgCl reference electrode in phosphate buffered saline. The fabricated devices showed a typical behavior of an amperometric glucose sensor and a successful operation as a three-electrode system. Due to the integrability of the reference electrode and the use of low-temperature steps only, the new micromachined process can allow easy mass production of the device and the monolithic integration of signal processing circuitry in the future.
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