4.6 Article

Very low thermal expansion in TaO2F

Journal

JOURNAL OF SOLID STATE CHEMISTRY
Volume 173, Issue 1, Pages 45-48

Publisher

ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/S0022-4596(03)00077-X

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X-ray diffraction data for TaO2F from 20 to 400 K show a thermal expansion so low that we cannot be certain whether it is positive or negative. We estimate the absolute value of the thermal expansion coefficient to be less than 6 x 10(-7)/K. This then is comparable to that of amorphous SiO2, and is apparently unique behavior for a cubic material over such a large temperature range. (C) 2003 Elsevier Science (USA). All rights reserved.

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