4.5 Article

An internal stress pattern in free standing films

Journal

PHYSICS LETTERS A
Volume 312, Issue 1-2, Pages 119-122

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/S0375-9601(03)00612-1

Keywords

thin film growth; stress pattern; crack; liquid substrate

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We report a sinusoid appearance of cracks existing in a continuous nickel (Ni) film system deposited on silicone oil surfaces. The sinusoid cracks start from the sample edges or from other cracks, then their oscillatory amplitudes decrease gradually as they extend and finally disappear. One crack may bifurcate into two or three cracks, or two cracks may coalesce harmoniously. The sinusoid appearance of the cracks represents a sinusoid stress pattern in the Ni films, which mainly results from the characteristic boundary condition and interactions among the atoms in these free sustained films. (C) 2003 Elsevier Science B.V. All rights reserved.

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