4.7 Article

Microstructure and nanoindentation hardness of Al/Al3Sc multilayers

Journal

ACTA MATERIALIA
Volume 51, Issue 11, Pages 3171-3184

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/S1359-6454(03)00128-9

Keywords

hardness; transmission electron microscopy (TEM); multilayer thin films; X-ray diffraction (XRD); nanoindention

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In the present paper, we discuss the fabrication, characterization and mechanical properties of a unique multilayer system constructed of aluminum and scandium. Thin film deposition techniques have been used to create high-quality polycrystalline multilayered films consisting of inherently soft Al layers (6-100 nm thick) separated by thin (0.5-5 nm) layers of Al3Sc. We use X-ray diffraction, transmission electron microscopy and in situ wafer curvature to characterize the microstructure and intermixing of the Al/Al3Sc multilayer films produced by sputter deposition for this work. The accompanying hardness results show that layering with nanoscale coherent Al3SC layers increases the hardness by between 200 and 500% over that of a pure aluminum film. (C) 2003 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.

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