Journal
APPLIED PHYSICS LETTERS
Volume 82, Issue 26, Pages 4708-4710Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1588373
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Structural and electrical characteristics of the metal-insulator-semiconductor (MIS) structures of Al/Al2O3/Si containing Ge nanoclusters are experimentally demonstrated. Secondary ion mass spectroscopy results indicate the out-diffusion of Ge after annealing at 800 degreesC in N-2 ambient for 30 min. An increment of leakage current is observed due to the out-diffusion of Ge. Capacitance-voltage studies indicate that annealing can effectively passivate the negatively charged trapping centers. Memory effect of the Ge nanoclusters is verified by the hysteresis in the C-V curves in the annealed sample. (C) 2003 American Institute of Physics.
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