Journal
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume 42, Issue 8, Pages 5306-5312Publisher
INST PURE APPLIED PHYSICS
DOI: 10.1143/JJAP.42.5306
Keywords
TOF-MS; mass resolution; plasma-enhanced chemical vapor deposition; PECVD; processing plasma; silane plasma; cluster; higher silane; particle generation; a-Si : H film; dusty plasma
Categories
Ask authors/readers for more resources
It is desired that mass spectrometers should be compact and cost effective for use a's diagnostic or monitoring tools. We examine the factors which restrict the optimum value of mass resolution attainable for time-of-flight mass spectrometers (TOF-MSs) of compact size. We have developed a 1 in long TOF-MS to diagnose plasma processes. As basic specifications, we obtained a wide mass. range of over 20,000 u/e as well as a high mass resolution of up to 2,500. We succeeded in observing various kinds of positive and negative ionic polysilane molecules in addition to the neutrals in a demonstrative diagnosis of the typical silane plasmas relevant to the deposition of the hydrogenated amorphous-silicon thin-film solar cells. This diagnostic system may be a versatile and powerful tool to investigate the detailed reaction processes in various processing plasmas for thin-film deposition and surface treatment.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available