An improved continuous compositional-spread technique based on pulsed-laser deposition and applicable to large substrate areas

A method for continuous compositional-spread (CCS) thin-film fabrication based on pulsed-laser deposition (PLD) is introduced. This approach is based on a translation of the substrate heater and the synchronized firing of the excimer laser, with the deposition occurring through a slit-shaped aperture. Alloying is achieved during film growth (possible at elevated temperature) by the repeated sequential deposition of submonolayer amounts. Our approach overcomes serious shortcomings in previous in situ implementation of CCS based on sputtering or PLD, in particular the variation of thickness across the compositional spread and the differing deposition energetics as a function of position. While moving-shutter techniques are appropriate for PLD approaches yielding complete spreads on small substrates (i.e., small as compared to distances over which the deposition parameters in PLD vary, typically approximate to1 cm), our method can be used to fabricate samples that are large enough for individual compositions to be analyzed by conventional techniques, including temperature-dependent measurements of resistivity and dielectric and magnetic properties (i.e., superconducting quantum interference device magnetometry). Initial results are shown for spreads of (Sr1-xCax)RuO3. (C) 2003 American Institute of Physics.