4.3 Article

High performance 0.25 μm gate-length AlGaN/GaN HEMTs on sapphire with power density of over 4.5 W/mm at 20 GHz

Journal

SOLID-STATE ELECTRONICS
Volume 47, Issue 9, Pages 1577-1580

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/S0038-1101(03)00078-9

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MOCVD-grown 0.25 mum gate-length AlGaN/GaN high electron mobility transistors (HEMTs) have been fabricated on sapphire substrates. These 0.25 gm gate-length devices exhibited maximum drain current density as high as 1.43 A/ mm, peak extrinsic transconductance of 354 mS/mm, unity current gain cut-off frequency (f(T)) of 61 GHz, and maximum frequency of oscillation (f(max)) of 89 GHz. At 20 GHz, a continuous-wave output power density of 4.65 W/mm with power-added-efficiency of 29.9% was obtained, yielding the highest reported power performance of AlGaN/GaN HEMT grown on sapphire at 20 GHz. (C) 2003 Elsevier Science Ltd. All rights reserved.

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