Journal
APPLIED PHYSICS LETTERS
Volume 83, Issue 13, Pages 2545-2547Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1613362
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Room-temperature nanoimprint lithography in air is used in order to pattern a nonthermoplastic, low-molar-mass thiophene-based pentamer with excellent gain properties. No degradation of the luminescence efficiency of the active medium was observed after patterning. In this way, we fabricated single-mode emission distributed feedback lasers having a threshold excitation fluence of 140 muJ/cm(2). The lasing line is peaked at 637 nm and exhibits a linewidth of less than 0.7 nm and a well-behaved input-output characteristic in the whole range of pump fluences. These results demonstrate room-temperature nanoimprint lithography as powerful and straightforward fabrication technique for oligomer-based nanostructured optoelectronic devices. (C) 2003 American Institute of Physics.
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