Journal
JOURNAL OF MATERIALS RESEARCH
Volume 18, Issue 10, Pages 2296-2299Publisher
CAMBRIDGE UNIV PRESS
DOI: 10.1557/JMR.2003.0321
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Nanoporous tungsten oxide (WO3), with pores of 50 to 100 nm in diameter, has been obtained by galvanostatic (constant-current) anodization of tungsten in a 0.25 M oxalic acid electrolyte. At room temperature, the optimum current density for nanoporous formation is approximately 6.5 to 8 mA/cm(2). Monitoring of the anodization voltage during the fabrication process reveals a close match with the theoretical model of Parkhutik et al. [V.P. Parkhutik and V.I. Shershulsky, J. Phys. D 25, 1258 (1992)] for growth of nanoporous Al2O3. The as-anodized films are amorphous and crystallize upon annealing at 350 degreesC in an oxygen atmosphere.
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