Journal
SYNTHETIC METALS
Volume 139, Issue 3, Pages 621-624Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0379-6779(03)00276-5
Keywords
surface enhanced Raman scattering; surface plasmons; electron-beam lithography
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As a first step towards near-field Raman, we chose to study surface enhanced Raman scattering (SERS)-active substrates to cope with the weakness of Raman scattering (small cross-section and low concentration). We concentrated our work on localized surface plasmon (LSP) since they turned out to play a great part in SERS and we put forward the relation between LSP resonance and Raman enhancement. Roughness of our samples is controlled either by annealing process or electron-beam lithography (EBL); this latter technique proved to best suit to our study. Substrates are characterized by extinction spectroscopy which determines the LSP resonance and then Raman spectrum of a probe molecule, trans-1,2-bis(4-pyridyl)ethylene (BPE) is recorded. We show that maximum of enhancement is obtained when the LSP resonance is red-shifted (50 nm) compared to the excitation laser line (632.8 nm). (C) 2003 Elsevier Science B.V. All rights reserved.
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