Journal
ADVANCED MATERIALS
Volume 15, Issue 20, Pages 1733-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200305331
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A new aerosol-assisted surfactant self-assembly approach has been developed for large-scale mesostructured silica thin film fabrication. The formation mechanism involves coalescence of semisolid surfactant-silica mesostructured particles on substrates (see Figure) and subsequent reassembly of the mesostructures to adapt the morphology transformation from spherical to planar shape.
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