Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 21, Issue 6, Pages 2755-2759Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.1627814
Keywords
-
Ask authors/readers for more resources
We report a process which integrates interference lithography, nanoimprint lithography, and anisotropic etching to fabricate replicated diffraction gratings with sawtooth profiles. This new process greatly reduces grating fabrication time and cost, while preserving the groove shape and smoothness. Relief gratings with 400 nm period inverted triangular profiles and 200 nm period gratings with 7degrees blaze angle were replicated from silicon masters with surface roughness of less than 1 nm. This process was developed for fabricating the off-plane blazed diffraction gratings for the NASA Constellation-X x-ray telescope. (C) 2003 American Vacuum Society.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available