Journal
THIN SOLID FILMS
Volume 445, Issue 2, Pages 317-321Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(03)01178-7
Keywords
nickel oxide; optoelectronic devices; photoconductivity; solid-phase-epitaxy; zinc oxide
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A transparent ultraviolet (UV)-detector was fabricated using a high-quality pn-heterojunction diode composed of transparent oxide semiconductors, p-type NiO and n-type ZnO, and its UV-response was measured at room temperature. Transparent tri-layered oxide films of ZnO/NiO/ITO were heteroepitaxially grown on an YSZ (1 1 1) substrate by a pulsed-laser-deposition combined with a solid-phase-epitaxy technique and they were processed to fabricate a p-NiO/n-ZnO diode. The diodes exhibited a clear rectifying I-V characteristic with an ideality factor of similar to2 and a forward threshold voltage of similar to1 V. Although the photoresponsivity was fairly weak at the zero bias voltage, it was enhanced up to similar to0.3 AW(-1) by applying a reverse bias of -6 V under an irradiation of 360-nm light, which is comparable to that of commercial devices. (C) 2003 Elsevier B.V. All rights reserved.
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