Journal
SURFACE SCIENCE
Volume 550, Issue 1-3, Pages 65-72Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.susc.2003.12.010
Keywords
scanning tunneling microscopy; scanning tunneling spectroscopies; chemisorption; sticking; surface electronic phenomena (work function; surface potential, surface states, etc.); density functional calculations; copper
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A possible relationship between population of the surface electronic state and chemical reactivity for Cu layers on Ru(0 0 0 1) is revealed by tunneling spectroscopy and microscopy. The surface state shifts down in energy with increasing thickness. Ab initio calculations indicate that the energy shift can be assigned to the decreasing tensile strain of the deposited film. The reactivity of the surface towards oxygen correlates with the population of this state, reaching a maximum at Cu thicknesses where the surface state is empty. These data provides an indication of the effect of strain on the reactivity of metal surfaces. (C) 2003 Elsevier B.V. All rights reserved.
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