In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (muTAS), the microfilter was fabricated and its filtering property was demonstrated. (C) 2003 Elsevier B.V. All rights reserved.