Journal
CHEMICAL COMMUNICATIONS
Volume -, Issue 7, Pages 780-781Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/b316656b
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Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 mum. Pyrolysis of the patterned polymer at 900 degreesC under a N-2 atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.
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