Lithography application of a novel photoresist for patterning of cells

Photolithography is the current workhorse for the microelectronic industry. It has been used extensively for the creation of patterns on two-dimensional surfaces. Various research groups have studied the use of photolithography to pattern surfaces for the alignment of cells. So far, these applications have been limited due to the use of organic solvents in the pattern developing process, which can denature biomacromolecules that would be attached to the material. To address this problem, a novel bioactive photoresist (bioresist) based on the copolymer of methyl methacrylate and 3-(t-butoxycarbonyl)-N-vinyl-2-pyrrolidone (MMA:TBNVP) was prepared and in vitro fibroblast cell growth on this resist was studied. Results demonstrated that the resist is non-adhesive to the fibroblast cells. By deprotecting the t-BOC groups into carboxyl groups (MMA:D-TBNVP), the material became cell adhesive. Furthermore, cells were able to proliferate on the MMA:D-TBNVP surface. By culturing cells on the MMA:D-TBNVP surface in serum versus serum-free medium, we reached the conclusion that the chemistry of the deprotected copolymer indirectly promoted cell attachment through its absorbance of serum proteins on the material. Patterns of 25 mum x 25 mum lines were obtained by chemically manipulating the surface of the photoresist using UV lithography without any solvent development. Fibroblast cells were observed to align on the patterned surface. This resist could be a suitable candidate to improve the application of conventional lithography in direct protein patterning for the guided growth of cells. (C) 2003 Elsevier Ltd. All rights reserved.