4.8 Article

Creating a Stable Oxide at the Surface of Black Phosphorus

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 7, Issue 27, Pages 14557-14562

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.5b01297

Keywords

air stability; oxidation; black phosphorus; XPS

Funding

  1. ARC Laureate Fellowship [FL120100038]
  2. Singapore National Research Foundation, Prime Minister's Office, Singapore [R-144-000-295-281]
  3. National Research Foundation, Prime Minister's Office, Singapore under its Competitive Research Programme (CRP) [NRF-CRP9-2011-3]
  4. NSF [CHE-1301157]
  5. Banco Santander [CMMI-1036460]
  6. Multimodal Australian ScienceS Imaging and Visualisation Environment (MASSIVE)
  7. Division Of Chemistry
  8. Direct For Mathematical & Physical Scien [1301157] Funding Source: National Science Foundation

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The stability of the surface of in situ cleaved black phosphorus crystals upon exposure to atmosphere is investigated with synchrotron-based photoelectron spectroscopy. After 2 days atmosphere exposure a stable subnanometer layer of primarily P2O5 forms at the surface. The work function increases by 0.1 eV from 3.9 eV for as-cleaved black phosphorus to 4.0 eV after formation of the 0.4 nm thick oxide, with phosphorus core levels shifting by <0.1 eV. The results indicate minimal charge transfer, suggesting that the oxide layer is suitable for passivation or as an interface layer for further dielectric deposition.

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