Journal
CHEMISTRY OF MATERIALS
Volume 16, Issue 12, Pages 2489-2493Publisher
AMER CHEMICAL SOC
DOI: 10.1021/cm035195z
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The reaction of gallium trichloride and methanol under atmospheric pressure chemical vapor deposition conditions leads to the production of gallium oxide thin films on a variety of substrates. Scanning electron microscopy (SEM) indicated that an island growth mechanism predominated. X-ray photoelectron spectroscopy (XPS) revealed binding energy shifts of 530.6 eV for O 1s and 20.3 eV for Ga 3d. The films were X-ray amorphous. Energy-dispersive X-ray analysis (EDXA) and electron probe microanalysis (EPMA) gave coherent elemental compositions, indicating that a single phase Ga2O3 was made, with negligible impurity levels. The films showed little optical reflectance (similar to10%) and 65-75% total transmission from 400 to 800 nm. Gas-sensing experiments indicated that the films responded best to a reducing gas at 450 degreesC.
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