Journal
APPLIED SURFACE SCIENCE
Volume 297, Issue -, Pages 153-157Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2014.01.109
Keywords
rf-Sputtering; CuO; GXRD; XPS; TFT
Categories
Funding
- Department of Science and Technology, Government of India under Nanoscience and Technology Initiative Program
Ask authors/readers for more resources
Copper oxide thin films were grown by rf magnetron sputtering on glass substrates at room temperature varying the oxygen partial pressure. Using the XRD and XPS analytical measurements, the deposition condition for the formation of Cu2O and CuO phases were optimised. The optical band gap of the Cu2O and CuO was 2.31 and 1.41 eV, respectively. The bottom gate structured transparent TFTs fabricated using p-type CuO active layers operated in enhancement mode with an on/off ratio of 10(4) and field-effect mobility of 0.01 cm(2)/V s. (C) 2014 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available