Journal
IEEE TRANSACTIONS ON MAGNETICS
Volume 40, Issue 4, Pages 2784-2786Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TMAG.2004.832445
Keywords
electrical resistivity; FeRh alloy film; ion-beam sputtering; magnetic phase transition; thermal elasticity
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Thermal elasticity and electrical resistivity with the magnetic phase transition were studied in FeRh alloy films prepared by ion-beam sputtering and subjected to post-annealing. Fe49.7Rh50.3 and Fe48.9Rh51.1 films deposited on conventional glass substrate and subjected to post-annealing at 600degreesC for 90 min, respectively. Both films show a considerably sharp transition. In particular, Fe49.7Rh50.3 film exhibits small thermal hysteresis of about 20degreesC width, which is only about 2 times over than that of bulk. Furthermore, a large abrupt thermal strain over 2 x 10(-3) was observed with the magnetic transition. These results indicate that strictly controlled an equiatomic composition is an effective way to obtain the FeRh film with abrupt magnetic phase transition under low temperature and short time annealing.
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