4.7 Article

AFM imaging and fractal analysis of surface roughness of AIN epilayers on sapphire substrates

Journal

APPLIED SURFACE SCIENCE
Volume 312, Issue -, Pages 81-86

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2014.05.086

Keywords

Aluminum nitride; Epitaxy; Substrate; Surface roughness; Atomic force microscopy; Fractal analysis

Funding

  1. European Centre of Excellence CEITEC [CZ.1.05/1.1.00/02.0068]
  2. Information and Communication Systems SIX [CZ.1.05/2.1.00/03.0072]
  3. [FEKT-S-14-2240]

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The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AIN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AIN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AIN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis). (C) 2014 Elsevier B.V. All rights reserved.

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