4.7 Article

UV and air stability of high-efficiency photoluminescent silicon nanocrystals

Journal

APPLIED SURFACE SCIENCE
Volume 323, Issue -, Pages 54-58

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2014.08.027

Keywords

Silicon nanocrystals; Nonthermal plasma; Phosphorous (P) doping; Photoluminescence quantum yield; UV stability

Funding

  1. Dow Corning Corporation [CON000000027918]

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The effects of UV light and air exposure on the photoluminescent properties of nonthermal plasma-synthesized silicon nanocrystals (Si NCs) were investigated. Si NCs with high-efficiency photoluminescence (PL) have been achieved via a post-synthesis hydrosilylation process. Photobleaching is observed within the first few hours of ultra-violet (UV) irradiation. Equilibrium is reached after similar to 4 h of UV exposure wherein the Si NCs are able to retain 52% of the initially measured PL quantum yield (PLQY). UV-treated Si NCs showed recovery of PL with time. Gas-phase passivation of Si NCs by hydrogen afterglow injection improves PLQY and PL stability against UV and air exposure. Additionally, phosphorous doping can also improve UV stability of photoluminescent Si NCs. (C) 2014 Elsevier B.V. All rights reserved.

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