Journal
APPLIED SURFACE SCIENCE
Volume 266, Issue -, Pages 170-175Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2012.11.123
Keywords
Boron carbide; Titanium interlayer; Plasma sputtering; Plasma chemical vapor deposition; Internal stress; Roughness
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Boron-based coatings can be very useful in neutrons detection application. Here, stable boron carbon (B-C) films in nanometer scale were deposited on silicon substrates with titanium interlayer by RF plasma magnetron sputtering. Ti interlayer is likely to decrease the internal stress at the substrate-film interface, thus smoothing the difference in lattice parameters between the growing film and substrate. The B-C/Ti/Si coatings were characterized using SEM, EDS, AFM and XRD. The enhancement in adhesion of the B-C film to the substrate was analyzed by a scratch tester measurements. (c) 2012 Elsevier B.V. All rights reserved.
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