4.7 Article

Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication

Journal

APPLIED SURFACE SCIENCE
Volume 276, Issue -, Pages 1-6

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2013.02.001

Keywords

Extracellular matrix; Plasma; Atmospheric-pressure plasma; Patterning; Biochip

Funding

  1. Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan [22740365]
  2. Institute for Molecular Science
  3. Grants-in-Aid for Scientific Research [22740365, 22244075] Funding Source: KAKEN

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Grid patterns of extracellular matrices (ECMs) have been formed on silicon (Si) substrates with the use of low-temperature atmospheric-pressure plasma (APP) jets with metal stencil masks and neuron model cells have been successfully cultured on the patterned ECMs. Arrangement of living neuron cells on a microelectronics chip in a desired pattern is one of the major challenges for the fabrication of neuron-cell biochips. The APP-based technique presented in this study offers a cost-effective solution to this problem by providing a simple patterning method of ECMs, which act as biological interfaces between living cells and non-biological materials such as Si. (C) 2013 Published by Elsevier B.V.

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