Journal
APPLIED SURFACE SCIENCE
Volume 283, Issue -, Pages 81-86Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2013.06.029
Keywords
Reduced graphene oxide nanosheets; Patterned; Field-emission; Electrophoretic deposition
Categories
Funding
- Natural Science Foundation of China [51002030]
- International cooperation Project in Suzhou [5H201117]
- Southeast University
- New Century Talents of Ministry of Education [NCET-11-0095]
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Well defined patterns of SU-8 photoresist were fabricated using typical photolithographic process on high conductive silicon substrate. Electrophoretic deposition of reduced graphene oxide nanosheets (RGOS) on patterned SU-8 photoresist was conducted at room-temperature. The thin SU-8 photoresist could prevent the transverse deposition of RGOS over the photoresist areas to some extent. A little amount of RGOS at SU-8 photoresist areas were removed by rinsing treatment due to the hydrophobic nature of SU-8 and result in the formation of patterned RGOS films. The field-emission properties of patterned RGOS films show low turn-on electrical field and high current density. The low-cost and scale-up fabrication method can be easily utilized for assembly and integration of RGOS into patterned RGOS film for the field emission display applications at room-temperature. (C) 2013 Published by Elsevier B.V.
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