Journal
APPLIED SURFACE SCIENCE
Volume 258, Issue 23, Pages 9198-9201Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2011.07.077
Keywords
Tungsten carbide; Ultra-short pulse laser; Pulsed laser deposition; Nanoparticles
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Ultra-short Pulsed Laser Deposition has been applied to the production of thin films from a tungsten carbide target. The gaseous phase obtained by the laser ablation shows a very weak primary plume, in contrast with a very strong secondary one. The deposited films, investigated by Scanning Electron Microscopy, Atomic Force Microscopy, X-Ray Photoelectron Spectroscopy and X-Ray Diffraction, present a mixture of WC and other phases with lower carbon content. All films are amorphous, independently from the substrate temperature. The characteristics of the deposits have been explained in terms of thermal evaporation and cooling rate of molten particles ejected from the target. (C) 2011 Elsevier B. V. All rights reserved.
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