Journal
APPLIED SURFACE SCIENCE
Volume 257, Issue 20, Pages 8550-8557Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2011.05.013
Keywords
Multilayers; Ti/TiAlN; Etching; Hardness; Residual stresses; Physical vapor deposition (PVD)
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Funding
- DFG [TR 73]
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In this research work, Ti/TiAlN multilayers of various designs were deposited onto substrates pretreated by different etching procedures. The influence of multilayer design and substrate pretreatment on multilayers adhesion, hardness, wear and friction coefficients was systematically analyzed and correlated with residual stresses of these multilayers as well as with residual stresses on the coating-near substrate region, which were analyzed by synchrotron X-ray diffraction at HZB-BESSYII. These investigations show that the adhesion can be improved by a specific etching procedure, which cause increased compressive stress in the coating-near the substrate region. Additionally, it was found, that the multilayer with the thickest ceramic layers has the highest hardness and the lowest wear coefficients as well as the lowest compressive residual stress within studied multilayers. (C) 2011 Elsevier B.V. All rights reserved.
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