Journal
APPLIED SURFACE SCIENCE
Volume 257, Issue 24, Pages 10715-10720Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2011.07.085
Keywords
Si doped TiO2 thin films; Electron beam evaporation; Annealing; Photocatalytic activity
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Funding
- National Natural Science Foundation of China [50972059]
- Ministry of Science and Technology of PRC [5, 6]
- Science and Technology Developing Item of Nanjing city [200901061]
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Transparent Si-doped TiO2 thin films (Si-TiO2) were deposited on quartz glasses using electron beam evaporation (EBE) and annealed at different temperature in an air atmosphere. The structure and morphology of these films were analyzed by X-ray diffraction (XRD), Raman microscopy (Raman), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Meanwhile the photocatalytic activity of the films has also been evaluated on the basis of the degradation degree of rhodamine B in aqueous solution. Our experimental results suggest that the annealing temperature impact a strong effect on the structure, morphology and photocatalytic activity of Si-TiO2 thin films. Furthermore the enhanced thermal stability of Si-TiO2 films enabled them to elevate the phase transformation temperature of TiO2 from anatase to rutile and enhanced the photocatalytic efficiency. (C) 2011 Elsevier B. V. All rights reserved.
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