4.7 Article

Annealing effects on the structural and electrical transport properties of n-type Bi2Te2.7Se0.3 thin films deposited by flash evaporation

Journal

APPLIED SURFACE SCIENCE
Volume 256, Issue 24, Pages 7365-7370

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2010.05.069

Keywords

Bi2Te2.7Se0.3; Thin film; Electrical transport properties; Annealing; Flash evaporation

Funding

  1. Jiangxi Provincial Education Department [GJJ09343]

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N-type Bi2Te2.7Se0.3 thermoelectric thin films with thickness 800nm have been deposited on glass substrates by. ash evaporation method at 473 K. Annealing effects on the thermoelectric properties of Bi2Te2.7Se0.3 thin films were examined in the temperature range 373-573 K. The structures, morphology and chemical composition of the thin films were characterized by X-ray diffraction, field emission scanning electron microscope and energy dispersive X-ray spectroscopy, respectively. Thermoelectric properties of the thin films have been evaluated by measurements of the electrical resistivity and See-beck coefficient at 300 K. The Hall coefficients were measured at room temperature by the Van der Pauw method. The carrier concentration and mobility were calculated from the Hall coefficient. The films thickness of the annealed samples was measured by ellipsometer. When annealed at 473 K, the electrical resistivity and Seebeck coefficient are 2.7 m Omega cm and -180 mu V/K, respectively. The maximum of thermoelectric power factor is enhanced to 12 mu W/cmK(2). Crown Copyright (C) 2010 Published by Elsevier B.V. All rights reserved.

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