Journal
APPLIED SURFACE SCIENCE
Volume 256, Issue 15, Pages 4850-4853Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2010.01.115
Keywords
High-kappa; Ge-FETs; Gate dielectrics
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High-kappa dielectrics SrZrO3 were prepared on Ge(0 0 1) substrate using pulse laser deposition, and band alignments and thermal annealing effects were studied with high resolution X-ray photoemission spectroscopy. Valence and conduction band offsets at this interface were measured to be 3.26 eV and 1.77 eV, respectively. Interfacial Ge oxide layers were found at the interface. After annealing at 600 degrees C, the interfacial Ge oxide layers were eliminated, and the valence band offset increased to 3.50 eV, but the amorphous SrZrO3 became polycrystalline in the meantime. (C) 2010 Elsevier B. V. All rights reserved.
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