Journal
APPLIED SURFACE SCIENCE
Volume 256, Issue 12, Pages 3856-3861Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2010.01.040
Keywords
Surface modification; Ceria; gamma-Aminopropyltriethoxysilane; Chemical mechanical polishing
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Funding
- National Integrate Circuit Research Program of China [2009ZX02030, 2009ZX02023]
- Programs from Science and Technology Council of Shanghai [0952nm00200, 08111100300]
- Shanghai Rising Star Program [07QH14017]
- National Basic Research Program of China [2007CB935400, 2010CB934300, 2006CB302700]
- National High Technology Development Program of China [2008AA031402]
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To improve their chemical mechanical polishing (CMP) performance, ceria nanoparticles were surface modified with gamma-aminopropyltriethoxysilane (APS) through silanization reaction with their surface hydroxyl group. The compositions, structures and dispersibility of the modified ceria particles were characterized by Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), laser particle size analyzer, zeta potential measurement and stability test, respectively. The results indicated that APS had been successfully grafted onto the surface of ceria nanoparticles, which led to the modified ceria nanoparticles with better dispersibility and stability than unmodified ceria particles in aqueous fluids. Then, CMP performance of the modified ceria nanoparticles on glass substrate was investigated. Experimental results showed that the modified ceria particles exhibited lower material removal rate (MRR) but much better surface quality than unmodified ceria particles, which may be explained by the hardness reduction of ceria particles, the enhancement of lubrication of the particles and substrate surfaces, and the elimination of the agglomeration among the ceria particles. (C) 2010 Elsevier B.V. All rights reserved.
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