Journal
APPLIED SURFACE SCIENCE
Volume 256, Issue 18, Pages 5644-5649Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2010.03.027
Keywords
GaSb; Passivation; Annealing; Photoluminescence; AFM; LPE; MBE
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A comparative analysis of the properties of the non-passivated and S-passivated GaSb(1 0 0) surfaces has been performed through PL, AFM and RHEED characterization. The samples treated with a 1 M Na2S aqueous solution demonstrate an increase in the 5 K PL intensity. According to AFM data, the annealing of the S-passivated GaSb(1 0 0) leads to the formation of the clean flat (1 0 0) surface. Moreover, after annealing the PL intensity of the S-passivated GaSb(1 0 0) surfaces decreases by 20%, whereas for the non-passivated samples it drops by more than a factor of 4. The method of wet sulfur passivation has shown great effectiveness in pre-epitaxial processing for LPE and MBE growth of the GaSb-related materials for optoelectronics. (C) 2010 Elsevier B.V. All rights reserved.
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