4.7 Article

Ternary semiconductor compounds CuInS2 (CIS) thin films synthesized by electrochemical atomic layer deposition (EC-ALD)

Journal

APPLIED SURFACE SCIENCE
Volume 256, Issue 13, Pages 4365-4369

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2010.02.032

Keywords

CuInS2; Gold substrate; Electrochemical atomic layer deposition; Underpotential deposition

Funding

  1. National Natural Science Foundation of China [20775030]

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In this paper the formation and characterization of the I-III-VI2 semiconductor compound CuInS2 (CIS) on gold substrate at room temperature by electrochemical atomic layer deposition (EC-ALD) method are reported. Optimum deposition potentials for each element are determined using cyclic voltammetry (CV) technique and Amperometric I-t method is used to prepare the semiconductor compound. These thin films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FE-SEM) and Fourier transform infrared spectroscopy (FT-IR). XRD results indicate that the CIS thin films have a (1 1 2) preferred orientation. The XPS analyses of the films reveal that Cu, In and S are present in an atomic ratio of approximately 1:1:2. And their semiconductor band gaps are found to be 1.50 eV by FT-IR. (C) 2010 Elsevier B. V. All rights reserved.

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