4.7 Article

Characterization of copper SERS-active substrates prepared by electrochemical deposition

Journal

APPLIED SURFACE SCIENCE
Volume 255, Issue 18, Pages 7864-7870

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2009.04.152

Keywords

Surface Enhanced Raman Scattering (SERS); Atomic Force Microscopy (AFM); Scanning Electron Microscopy (SEM); Copper; Electrochemical deposition

Funding

  1. Grant Agency of the Czech Republic [GD 104/08/H055]
  2. Grant Agency of the Czech Academy of Science [KAN 208240651]
  3. Ministry of Education, Youth and Sports of the Czech Republic [MSM 6046137307, MSM 604617306]
  4. Department of Research and Development of the Institute of Chemical Technology Prague [402080016]

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Surface Enhanced Raman Scattering (SERS) on copper substrates of various morphologies, prepared by electrochemical deposition on platinum targets, was investigated. The substrate preparation procedures differed by the coating bath compositions, applied current densities and the duration of individual steps. The surface morphology of the substrates was visualized by means of Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM). SERS spectra of selected organic thiols were measured and the relation between SERS spectral intensity and the surface structure of SERS-active substrates was studied. It has been shown that good Raman surface enhancement can be achieved on the copper substrates prepared by electrochemical deposition from ammoniac baths. Copper substrates fabricated from acidic baths did not show efficient Raman surface enhancement. The results of microscopic measurements demonstrated that the average surface roughness value does not play a substantial role, whereas the shape of the surface nanostructures is a key parameter. (C) 2009 Elsevier B. V. All rights reserved.

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