4.7 Article

Biaxial stresses, surface roughness and microstructure in evaporated TiO2 films with different deposition geometries

Journal

APPLIED SURFACE SCIENCE
Volume 256, Issue 3, Pages 870-875

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2009.08.077

Keywords

Thin film; Electron-beam evaporation; Biaxial stress

Funding

  1. National Science Council of Taiwan, R.O.C. [NSC 96-2221-E-035-067-MY3]

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The residual stresses, surface roughness and microstructure in titanium oxide films prepared by electron-beam evaporation and deposited with different geometries were investigated, with particular focus on the in-plane anisotropy of the biaxial stresses and microstructures. Thin films were deposited with various deposition angles on B270 glass substrates and silicon wafers. Two different types of deposition geometries were studied. The residual stress in the thin films was examined by a phase-shifting Twyman-Green interferometer. The optical constants, biaxial stress and surface roughness were found to be related to the evolution of the anisotropic microstructures in the films. The results revealed that the anisotropic stresses that developed in the evaporated titanium oxide films were dependent upon the deposition geometry and microstructure of the films. (C) 2009 Elsevier B. V. All rights reserved.

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