Journal
APPLIED SURFACE SCIENCE
Volume 255, Issue 8, Pages 4401-4404Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2008.10.129
Keywords
Ga2(1-x)In2xO3 films; Microstructure; Optical properties; MOCVD
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Ga2(1-x)In2xO3 thin films with different indium content x[In/(Ga+In) atomic ratio] were prepared on alpha-Al2O3 (0 0 0 1) substrates by the metal organic chemical vapor deposition (MOCVD). The structural and optical properties of the Ga2(1-x)In2xO3 films were investigated in detail. Microstructure analysis revealed that the film deposited with composition x = 0.2 was polycrystalline structure and the sample prepared with x up to 0.8 exhibited single crystalline structure of In2O3. The optical band gap of the films varied with increasing Ga content from 3.72 to 4.58 eV. The average transmittance for the films in the visible range was over 90%. (C) 2008 Elsevier B. V. All rights reserved.
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