Journal
APPLIED SURFACE SCIENCE
Volume 255, Issue 8, Pages 4670-4672Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2008.12.020
Keywords
Metal nanoparticle; Porous silicon; Metal-particle-enhanced HF etching; Electroless deposition; Magnetic recoding; Cobalt
Categories
Funding
- CREST
- Hyogo Prefecture and for Scientific Research
- JSPS [20560676]
- Grants-in-Aid for Scientific Research [20560676] Funding Source: KAKEN
Ask authors/readers for more resources
Metal filled Si nanopores, that is, metal nanorods in an Si matrix, are produced by an electroless process that consists of three steps: (1) electroless displacement deposition of metal nanoparticles from a metal salt solution containing HF; (2) Si nanopore formation by metal-particle-enhanced HF etching; and (3) metal filling in nanopores by autocatalytic electroless deposition. Ag nanoparticles produce Si nanopores whose sizes are a few tens of nm in diameter and ca. 50 nm deep. Au nanoparticles produce finer and straighter nanopores on Si than the Ag case. These nanopores are filled with a Co or a Co-Ni alloy by autocatalytic deposition using dimethylamine-borane as a reducing agent. Phosphinate can be used as a reducing agent for the Au-deposited-and-pore-formed Si. The important feature of this process is that the metal nanoparticles, that is, the initiation points of the autocatalytic metal deposition, are present on the bottoms of the Si nanopores. (C) 2008 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available