Journal
JOURNAL OF OPTICS B-QUANTUM AND SEMICLASSICAL OPTICS
Volume 6, Issue 8, Pages S811-S815Publisher
IOP PUBLISHING LTD
DOI: 10.1088/1464-4266/6/8/029
Keywords
quantum imaging; quantum metrology; shot-noise; standard quantum limit
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Funding
- Engineering and Physical Sciences Research Council [GR/S56252/01] Funding Source: researchfish
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We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglement. Mathematically, the hyper-resolution of quantum lithography appears naturally in the derivation of Heisenberg-limited parameter estimation. We also review recent experiments offering a proof of the principle of quantum lithography, and we address the question of state preparation and the fabrication of suitable photoresists.
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