Journal
APPLIED SURFACE SCIENCE
Volume 254, Issue 18, Pages 5750-5756Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2008.03.042
Keywords
Monte Carlo simulations; sputtering; sputtered particle transport
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Sputter deposition is a complex process; it is obvious that the energy and direction of the particles arriving at the substrate is in close relation with the transport process from the target to the substrate, it is desirable to model this transport of atoms through the background gas. The transport of sputtered Ag atoms during sputter deposition through the gas phase in the facing targets sputtering system studied by Monte Carlo simulation is presented. The model calculates the flux of the atoms arriving at the substrate, their energy, direction and number of collisions they underwent. The dependence of the deposition rates of Ag atoms on the gas pressure and the distance between the targets and substrate were investigated. (c) 2008 Elsevier B.V. All rights reserved.
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