Using soft lithography to pattern highly oriented polyacetylene (HOPA) films via solventless polymerization

A new application of the combination of soft lithography and solventless polymerization is described (see Figure)-the patterning of ultra-hard microstructures in selected areas using highly oriented polyacetylene (HOPA) films as a precursor. It is expected that this simple, low-cost, and mild process will lead to the formation of highly oriented films of other materials, e.g., electro-optically active polymers.