4.8 Article

An in situ XPS study of site competition between CO and NO on Rh(111) in equilibrium with the gas phase

Journal

JOURNAL OF CATALYSIS
Volume 226, Issue 1, Pages 83-87

Publisher

ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcat.2004.05.010

Keywords

CO oxidation; NO reduction; in situ photoelectron spectroscopy

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The nature of the adsorption sites of CO and NO as they compete to adsorb on a Rh(111) surface has been determined using by X-ray photoelectron spectroscopy in situ, under gas mixtures of the reactants in the Pascal pressure range. It was found that near room temperature NO readily displaced CO from threefold hollow sites when the NO partial pressure was below 30%. CO is displaced from top sites only at higher NO pressures and after heating. The kinetics of CO:NO exchange at top sites is very slow at room temperature (hours), and requires heating for complete exchange. (C) 2004 Elsevier Inc. All rights reserved.

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